The Mass Spectrometry society of Japan - The 71st Annual Conference on Mass Spectrometry, Japan
Japanese

Abstract

Table of contents

Timetable

Plenary Lecture

Symposium Sessions (Day1, Day2, Day3)

Basic Sessions (Day1, Day2, Day3)

Young Researchers' Sessions (Day1, Day2, Day3)

Poster Presentations (Day1, Day2, Day3)

Special Evening Sessions

Corporate Program

Poster Presentations

Day 2, May 16（Tue.）　　Room P (Foyer, Room 1004-1007)

2P-56　　PDF

Non-selective Etching of Synthetic Polymers Investigated by Electrospray Droplet Impact/Secondary Ion Mass Spectrometry (EDI/SIMS)

(1Univ. Yamanashi, 2Johns Hopkins Univ.)
oSatoshi Ninomiya1, Yuji Sakai1, Noriyuki Kubota1, Stephanie Rankin-Turner1,2, Kenzo Hiraoka1

Among various types of cluster secondary ion mass spectrometry (SIMS), electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) is unique due to its high ionization efficiency and non-selective atomic/molecular-level surface etching ability. In this study, EDI/SIMS was applied to synthetic polymers of polystyrene (PS) and poly(9,9-di-n-octylfluonyl-2,7diyl) (PFO) spin-coated on a silicon substrate.