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オーラルセッション
- 第2日 5月16日（木） 10:30～10:50 E会場（201）
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2E-O1-1030 PDF
真空エレクトロスプレー液滴イオン衝撃によるスパッタ率と二次イオン収率の精密評価
Cluster ion beams such as Bi cluster and Ar gas cluster ion beams have been studied in order to improve the performance of secondary ion mass spectrometry (SIMS). In the previous studies, we have developed a novel massive cluster ion beam gun using vacuum electrospray of aqueous solutions. In this study, the sputtering and secondary ion yields produced by the vacuum electrospray droplet ion beams were evaluated using atomic force microscopy and time-of-flight mass spectrometer.