ポスター発表
第1日 6月10日（月） P会場（多目的ホール・大会議室101＋102）P1会場（多目的ホール）・P2会場（会議室101＋102）
- 1P-17
InertMask技術を応用したIM ColumnのLC-MS/MS分析への適用
(ジーエルサイエンス)
o村山希・ 本川正規・ 加納未夏・ 橋本淳一
In recent years, the need for reliable and highly sensitive analysis using LC/MS has increased significantly. In the HPLC analysis of metal-adsorbing compounds, the influence of adsorption on the inner surface of the column hardware cannot be ignored for obtaining high sensitivity in LC/MS analysis. The InertMask (IM) is our new metal surface treatment, that is an organic silicon oxide layer on a metal surface such as stainless steel. This IM technology is very effective for the piping parts of the analyzer that is concerned about metal-assignment adsorption such as acidic compounds and basic compounds. We developed a new metal-free stainless steel HPLC column: IM Column. In LC/MS analysis of phosphorated compounds, the IM Column reduces a specific adsorption of analytes particularly on column hardware surface and leads to improving sensitivity and peak shape. In this report, we suggest that the use of the IM Column is the one of effective method for analysis of metal-adsorbing compounds in LC/MS.