Table of contents
Oral Sessions (Day1, Day2, Day3)
Poster Presentations
(Day1, Day2, Day3)
Oral Sessions
- Day 2, May 16（Thu.） 10:30-10:50 Room E (201)
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2E-O1-1030 PDF
Sputtering and Secondary Ion Yields Produced by the Vacuum Electrospray Droplet Ion Beams
Cluster ion beams such as Bi cluster and Ar gas cluster ion beams have been studied in order to improve the performance of secondary ion mass spectrometry (SIMS). In the previous studies, we have developed a novel massive cluster ion beam gun using vacuum electrospray of aqueous solutions. In this study, the sputtering and secondary ion yields produced by the vacuum electrospray droplet ion beams were evaluated using atomic force microscopy and time-of-flight mass spectrometer.