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Day 3, June 12（Wed.） 14:33-14:51 Room D (Conference Room 202)
- 3D-O2-1433
Informatics Technology to Extract Polymeric Feature Patterns from Multiple Kendrick Mass Defect Plots
(1JEOL, 2AIST)
oTakaya Satoh1, Naomi Watanabe1, Takafumi Sato1, Hideyuki Shinzawa2, Sayaka Nakamura2, Akihiro Oishi2, Hideaki Hagihara2, Hiroaki Sato2
MALDI-TOFMS, which can measure the polymer distribution in singly-charged ions, helps in the characterization of synthetic polymers. The combination of high-mass resolution MALDI-TOFMS and the Kendrick mass defect (KMD) method has improved the efficiency of the analysis of complex polymer mass spectra. However, there is still room for consideration of methods for comparing and classifying many complex mass spectra for purposes such as quality control. In this presentation, we investigated a data processing method that extracts characteristic patterns to make it easier to compare multiple KMD plots and whether it is possible to summarize and classify data by combining it with statistical analysis.