Abstract

Fundamental Sessions

Day 3, June 12（Wed.）　14:51-15:09　Room C (Conference Room 201)

The soft ionization technique by photoexcitation of nanofabricated microstructures on the surface of silicon substrates was investigated. Patterns of nanopillars with diameters ranging from 100 nm to 400 nm and heights of several hundred nm arrayed at pillar space varying from 100 nm to 400 nm were fabricated on a silicon substrate by electron beam lithography and dry etching techniques. Glycine solution was dropped onto the fabricated structures and the mass spectrum was measured by laser irradiation. As a result, protonated glycine was detected at lower laser intensities on the substrate with nanostructures compared to the flat surface of Si substrate. It is considered that the substrates with nanostructures have a high optical absorption, suggesting that efficient optical absorption accelerated ionization. There were also significant differences in the ion intensity detected depending on the structure size. In this report, the correlation between the fabricated structure size and soft ionization efficiency is discussed in more detail.

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