- Timetable
- Download all abstracts
- Plenary Lectures
- MSSJ Special Program
- Award Lecture
- Symposium Sessions(Day1, Day2)
- Fundamental Sessions(Day1, Day3)
- Young Researchers' Sessions (Int'l)(Day1, Day3)
- Young Researchers' Sessions(Day1, Day3)
- Poster Presentations(Day1, Day2, Day3)
- Evening Workshop
- Corporate Program
Poster Presentations
Day 1, June 10(Mon.) Room P1 (Multipurpose Hall)・Room P2 (Conference Room 101+102)
- 1P-17
Utilizing IM Column with InertMask Technology for LC-MS/MS
(GL Sciences)
oNozomi Murayama, Masanori Motokawa, Mika Kano, Junichi Hashimoto
In recent years, the need for reliable and highly sensitive analysis using LC/MS has increased significantly. In the HPLC analysis of metal-adsorbing compounds, the influence of adsorption on the inner surface of the column hardware cannot be ignored for obtaining high sensitivity in LC/MS analysis. The InertMask (IM) is our new metal surface treatment, that is an organic silicon oxide layer on a metal surface such as stainless steel. This IM technology is very effective for the piping parts of the analyzer that is concerned about metal-assignment adsorption such as acidic compounds and basic compounds. We developed a new metal-free stainless steel HPLC column: IM Column. In LC/MS analysis of phosphorated compounds, the IM Column reduces a specific adsorption of analytes particularly on column hardware surface and leads to improving sensitivity and peak shape. In this report, we suggest that the use of the IM Column is the one of effective method for analysis of metal-adsorbing compounds in LC/MS.