Abstract

Poster Presentations

Day 3: Friday, May 20  Poster Room(Gekko)

Application of Self-Cleaning Ion Source (SCIS) on the GC/MS

(1Agilent, 2NITech)
oTakeshi Serino1, Sadao Nakamura1, Hajime Ohtani2

The Self-Cleaning Ion Source (SCIS) of GC/MS is developed for preventing the contamination of EI source of GC/MS, that gives the longevity of EI performance for higher volatiles applications. We will review several applications of SCIS and the performances from the log of GC/MS auto tuning during the usage for 1 year and a half at the GC/MS lab in Japan.