オーラルセッション
- 第1日 5月11日（月） 15:30～15:50 B会場（1202）
-
1B-O2-1530 PDF
Csスパッター型負イオン源における負イオン生成プロセスの研究に向けて
Negative ion source using Cs sputtering is widely used in accelerator mass spectrometry (AMS). Nevertheless, the production process of negative ions is still not elucidated, and an attempt to establish a theoretical model that can predict the generated ions for practical applications. Estimation and control of the production process from sample condition enable us to increase ion beam current and suppress isobar interference, resulting in improvement of measurement efficiency and sensitivity. Laser photo-detachment (LPD) in AMS can apply only in the case if electron affinity (EA) of isobar nuclide is lower than that of the nuclide of interest. However, there are several nuclides which EA is higher than that of target nuclide in elemental form, but in the case of a molecular ion, its EA gets lower than EA of target nuclide. Therefore, LPD is available utilizing molecular ions. In this paper, we will introduce the recent study on the production process of negative ions of Cs sputter-negative ion source and discuss research plans and application to the LPD technique.