演題概要

オーラルセッション

第3日 5月20日(金) 9:40~10:00 B会場(星雲1)

川中/川下産業におけるLC/MSの活用-隠された成分の分析

(日立マクセル)
o篠本さやか若林寿枝

Recent progress of mass spectrometry accompanied with high sensitive detection, deconvolution, multivariate analysis and database search allow us to reveal unlabeled ingredients in the materials that will be used in the products. Here we demonstrate the manner in which LC/MS is applied to the quality control, such as the quantitative analysis of methanesulfonic acid in acrylic monomers and the between-lot variation of photopolymerization initiator.