演題概要

オーラルセッション

第3日 5月16日(金) 16:15~16:35 A会場(オービットホール)

レーザー脱離イオン化による有機薄膜の深さ方向分析の検討

(1JEOL2旭硝子3京大院工)
o佐藤貴弥1島政英1新美大伸1中島陽司2藤井麻樹子3瀬木利夫3松尾二郎3

In recent years, the electrical devices composed of organic and inorganic materials such as organic light-emitting diodes and organic semiconductor devices have been widely used. There are various techniques for surface analysis such as a SEM/EDS, EPMA, XPS, TOF-SIMS and so on. However, the analytical techniques to obtain the molecular information on organic layers in electronic devices are limited. In this presentation, we will discuss about the possibility to apply the depth profiling using laser desorption/ionization time-of-flight mass spectrometer (LDI-TOFMS) as a novel tool for analyzing organic layers in electronic devices.